Silicone carbide nanocrystals have been proposed as a promising material for optoelectronic, biomedical imaging or other diagnostic techniques. However, their fabrication in efficient bottom-up processes requires more effort. The main motivation of this project is to develop a low-cost, scalable, atmospheric pressure, plasma-based technique to produce small (less than 10 nm) nanocrystals of silicone carbide (SiC), suitable for photonic applications. This project is supported by a CCRC CCF grant.